Fast and industry-compatible, spatial atomic layer deposition (sALD) may revolutionize production of thin-film displays. Researchers at Holst Centre have shown that sALD can deliver semiconductor layers with better performance than physical vapor deposition (PVD) at the same – and potentially even higher – throughputs. An easily scalable, atmospheric-pressure process, sALD could soon become the preferred method for creating large-area thin-film and flexible devices.   A key step in producing n...